Duy’s PhotoFET article accepted in Applied Physics Letters

Congratulation to Duy for the acceptance of his article entitled “Photoresponsive properties of ultrathin silicon nanowires”  in Applied Physics Letters, a premier journal in Applied Physics. This work is in collaboration with Prof  Andreas Offenhäusser and Prof. Bernhard Wolfrum at the Forschungszentrum Jülich GmbH and also Prof Thomas Nann at the Wark.

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